The fabrication process of interdigitated-back-contacted silicon heterojunction (IBC-SHJ) solar cells has been significantly simplified with the development of the so-called tunnel-IBC architecture. This architecture utilizes a highly conductive (p)-type nanocrystalline silicon (nc-Si:H) layer deposited over the full substrate area comprising pre-patterned (n)-type nc-Si:H fingers. In this context, the (p)-type nc-Si:H layer is referred to as blanket layer. As both electrodes are connected to the same blanket layer, the high lateral conductivity of (p)nc-Si:H layer can potentially lead to relatively low shunt resistance in the device, thus limiting the performance of such solar cells. To overcome such limitation, we introduce a thin (<2 nm) full-area molybdenum oxide (MoO_x) layer as an alternative to the (p)nc-Si:H blanket layer. We demonstrate that the use of such a thin MoO_x minimizes the shunting losses thanks to its low lateral conductivity while preserving the simplified fabrication process. In this process, a novel (n)-type nc-Si:H/MoO_x electron collection contact stack is implemented within the proposed solar cell architecture. We assess its transport mechanisms via electrical simulations showing that electron transport, unlike in the case of tunnel-IBC, occurs in the conduction band fully. Moreover, the proposed contact stack is evaluated in terms of contact resistivity and integrated into a proof-of-concept front/back-contacted (FBC) SHJ solar cells. Contact resistivity as low as 100 mΩcm² is achieved, and fabricated FBC-SHJ solar cells obtain a fill factor above 81.5% and open-circuit voltage above 705 mV. Lastly, the IBC-SHJ solar cells featuring the MoO_x blanket layer are fabricated, exhibiting efficiencies up to 21.14% with high shunt resistances above 150 kΩcm². Further optimizations in terms of layer properties and fabrication process are proposed to improve device performance and realize the efficiency potential of our novel IBC-SHJ solar cell architecture.

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Transition metal oxide (TMO) thin films exhibit large bandgap and hold great potential for enhancing the performance of silicon heterojunction (SHJ) solar cells by increasing the short-circuit current density significantly. On the other hand, achieving precise control over the electrical properties of TMO layers is crucial for optimizing their function as efficient carrier-selective layer. This study demonstrates a general and feasible approach for manipulating the quality of several TMO films, aimed at enhancing their applicability in silicon heterojunction (SHJ) solar cells. The core of our method involves precise engineering of the interface between the TMO film and the underlying hydrogenated intrinsic amorphous silicon passivation layer by managing the reaction of the TMO on the surface. X-ray photoelectron spectroscopy spectra demonstrate that our methods can modify the oxygen content in TMO films, thereby adjusting their electronic properties. By applying this method, we have successfully fabricated WO_x-based SHJ solar cells with 23.30 % conversion efficiency and V₂O_x-based SHJ solar cells with 22.04 % conversion efficiency, while keeping n-type silicon-based electron-transport layer at the rear side. This research paves the way for extending such interface engineering methods to other TMO materials used as hole-transport layers in SHJ solar cells.

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Two terminal (2T) perovskite/copper-indium-gallium-selenide (CIGS) tandem solar cells combine high conversion efficiency with lightweight flexible substrates which can decrease manufacturing and installation costs. In order to improve the power conversion efficiency of these tandem solar cells, the use of advanced simulation tools is crucial to estimate the loss mechanisms. In this regard, most of the available simulation works on tandem solar cells are oriented to minimize optical losses and assuming simplifications for the electrical simulations in particular in the top and bottom cell interconnection at the so-called tunnel recombination junction (TRJ) neglecting the inner physics of the complete tandem device. Therefore, the effect of charge exchange mechanism between top and bottom soler cells on the external parameters of a tandem devices is not fully understood yet. In this work, we present an experimentally validated opto-electrical model based on the fundamental semiconductor equations for the study of loss mechanisms of a reference perovskite/CIGS solar cell. Different from other numerical works, because our simulation platform includes the fundamental working mechanisms of the layers comprising the TRJ, we can properly calculate the losses related to it. We firstly present the calibration and validation of our opto-electrical model with respect to three fabricated reference solar cells: top cell only, bottom cell only and tandem device. Then, we use the calibrated model to evaluate main loss mechanisms affecting the baseline tandem device. Finally, we use the model to propose a roadmap for the optimization of monolithic perovskite/CIGS tandem solar cells.

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Reducing indium consumption in transparent conductive oxide (TCO) layers is crucial for mass production of silicon heterojunction (SHJ) solar cells. In this contribution, optical simulation-assisted design and optimization of SHJ solar cells featuring MoO_x hole collectors with ultra-thin TCO layers is performed. Firstly, bifacial SHJ solar cells with MoO_x as the hole transport layer (HTL) and three types of n-contact as electron transport layer (ETL) are fabricated with 50 nm thick ITO on both sides. It is found that bilayer (nc-Si:H/a-Si:H) and trilayer (nc-SiO_x:H/nc-Si:H/a-Si:H) as n-contacts performed electronically and optically better than monolayer (a-Si:H) in bifacial SHJ cells, respectively. Then, as suggested by optical simulations, the same stack of tungsten-doped indium oxide (IWO) and optimized MgF₂ layers are applied on both sides of front/back-contacted SHJ solar cells. Devices endowed with 10 nm thick IWO and bilayer n-contact exhibit a certified efficiency of 21.66% and 20.66% when measured from MoO_x and n-contact side, respectively. Specifically, when illuminating from the MoO_x side, the short-circuit current density and the fill factor remain well above 40 mA cm⁻² and 77%, respectively. Compared to standard front/rear TCO thicknesses (75 nm/150 nm) deployed in monofacial SHJ solar cells, this represents over 90% TCO reduction. As for bifacial cells featuring 50 nm thick IWO layers, a champion device with a bilayer n-contact as ETL is obtained, which exhibits certified conversion efficiency of 23.25% and 22.75% when characterized from the MoO_x side and the n-layer side, respectively, with a bifaciality factor of 0.98. In general, by utilizing a n-type bilayer stack, bifaciality factor is above 0.96 and it can be further enhanced up to 0.99 by switching to a n-type trilayer stack. Again, compared to the aforementioned standard front/rear TCO thicknesses, this translates to a TCO reduction of more than 67%.

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Due to the unique microstructure of hydrogenated nanocrystalline silicon oxide (nc-SiO_x:H), the optoelectronic properties of this material can be tuned over a wide range, which makes it adaptable to different solar cell applications. In this work, the authors review the material properties of nc-SiO_x:H and the versatility of its applications in different types of solar cells. The review starts by introducing the growth principle of doped nc-SiO_x:H layers, the effect of oxygen content on the material properties, and the relationship between optoelectronic properties and its microstructure. A theoretical analysis of charge carrier transport mechanisms in silicon heterojunction (SHJ) solar cells with wide band gap layers is then presented. Afterwards, the authors focus on the recent developments in the implementation of nc-SiO_x:H and hydrogenated amorphous silicon oxide (a-SiO_x:H) films for SHJ, passivating contacts, and perovskite/silicon tandem devices.

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Monolithic perovskite/c-Si tandem solar cells have attracted enormous research attention and have achieved efficiencies above 30%. This work describes the development of monolithic tandem solar cells based on silicon heterojunction (SHJ) bottom- and perovskite top-cells and highlights light management techniques assisted by optical simulation. We first engineered (i)a-Si:H passivating layers for (100)-oriented flat c-Si surfaces and combined them with various (n)a-Si:H, (n)nc-Si:H, and (n)nc-SiOx:H interfacial layers for SHJ bottom-cells. In a symmetrical configuration, a long minority carrier lifetime of 16.9 ms was achieved when combining (i)a-Si:H bilayers with (n)nc-Si:H (extracted at the minority carrier density of 1015 cm-3). The perovskite sub-cell uses a photostable mixed-halide composition and surface passivation strategies to minimize energetic losses at charge-transport interfaces. This allows tandem efficiencies above 23% (a maximum of 24.6%) to be achieved using all three types of (n)-layers. Observations from experimentally prepared devices and optical simulations indicate that both (n)nc-SiOx:H and (n)nc-Si:H are promising for use in high-efficiency tandem solar cells. This is possible due to minimized reflection at the interfaces between the perovskite and SHJ sub-cells by optimized interference effects, demonstrating the applicability of such light management techniques to various tandem structures.

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Silicon heterojunction (SHJ) solar cells have reached high power conversion efficiency owing to their effective passivating contact structures. Improvements in the optoelectronic properties of these contacts can enable higher device efficiency, thus further consolidating the commercial potential of SHJ technology. Here we increase the efficiency of back junction SHJ solar cells with improved back contacts consisting of p-type doped nanocrystalline silicon and a transparent conductive oxide with a low sheet resistance. The electrical properties of the hole-selective contact are analysed and compared with a p-type doped amorphous silicon contact. We demonstrate improvement in the charge carrier transport and a low contact resistivity (<5 mΩ cm²). Eventually, we report a series of certified power conversion efficiencies of up to 26.81% and fill factors up to 86.59% on industry-grade silicon wafers (274 cm², M6 size).

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Silicon heterojunction (SHJ) solar cells have achieved a record efficiency of 26.81% in a front/back-contacted (FBC) configuration. Moreover, thanks to their advantageous high V_OC and good infrared response, SHJ solar cells can be further combined with wide bandgap perovskite cells forming tandem devices to enable efficiencies well above 33%. In this study, we present strategies to realize high-efficiency SHJ solar cells through combined theoretical and experimental studies, starting from the optimization of Si-based thin-film layers to the implementation of electrodes with reduced indium and silver usage. Advanced opto-electrical simulations, which enable comprehensive theoretical understandings of the main physical mechanisms governing carriers’ collection and light management, provide clear pathways for device designs and experimental optimizations. We present the fabricated FBC-SHJ solar cells in both monofacial and bifacial configurations with the best efficiencies of 24.18% and 23.25%, respectively. We point out that to achieve optimum device performance, the compositional materials should be holistically optimized and evaluated as part of the contact stacks with adjacent layers. As an outlook beyond the classical FBC-SHJ solar cell architecture, we propose various novel SHJ-based solar cell architectures. Their potential performance was assessed and compared via rigorous opto-electrical simulations and a maximal efficiency of 27.60% was simulated for FBC-SHJ solar cells featuring localized contacts.

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Passivating contacts are crucial for realizing high-performance crystalline silicon solar cells. Herein, contact formation by plasma-enhanced chemical vapor deposition (PECVD) followed by an annealing step is focused on. Poly-SiO_x passivating contacts by combining plasma-assisted N₂O-based oxidation of silicon (PANO-SiO_x) with a thin film of phosphorus (n⁺) or boron (p⁺)-doped hydrogenated amorphous silicon oxide (a-SiO_x:H) are manufactured. Postannealing is conducted for transitioning a-SiO_x:H into poly-SiO_x. The aim is to achieve a contact with low absorption and high-quality passivation. It is demonstrated that by tuning the plasma oxidation process time and power, the PANO-SiO_x thickness and its passivation quality can be controlled. A higher SiO₂ content is observed in PANO-SiO_x than in the nitric acid oxidation of silicon (NAOS-SiO_x) counterpart. PANO-SiO_x acts as a stronger diffusion barrier for both boron and phosphorus atoms compared to NAOS-SiO_x, affecting the dopant distribution during annealing. Implied open-circuit voltages up to 751 and 710 mV for n⁺ and p⁺ flat symmetric samples, respectively, are demonstrated. With respect to standard thermally grown SiO₂ tunneling oxide combined with (in/ex)situ-doped low-pressure chemical vapor deposition poly-Si, this study presents a simple alternative for manufacturing passivating contact fully based on PECVD processes.

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Passivating contacts based on poly-Si have enabled record-high c-Si solar cell efficiencies due to their excellent surface passivation quality and carrier selectivity. The eventual existence of pinholes within the ultra-thin SiOx layer is one of the key factors for carrier collection, beside the tunneling mechanism. However, pinholes are usually believed to have negative impact on the passivation quality of poly-Si passivating contacts. This work studied the influence of the pinhole density on the passivation quality of ion-implanted poly-Si passivating contacts by decoupling the pinhole generation from the dopants diffusion process by means of two annealing steps: (1) a pre-annealing step at high temperature after the intrinsic poly-Si deposition to visualize the formation of pinholes and (2) a post-annealing step for dopants activation/diffusion after ion-implantation. The pinhole density is quantified in the range of 1✕106 to 3✕108 cm2 by the TMAH selective etching approach. The passivation quality is discussed with respect to the pinhole density and the post-annealing thermal budget (TB) for dopants diffusion. The study shows that a moderate pinhole density does not induce doping profile variations that can be detectable by the coarse spatial resolution of ECV measurements. It is surprising that the existence of pinholes in a moderate density within our thickness fixed SiOx layer can effectively enhance the passivation qualities for both n+ and p+ poly-Si passivating contacts. We speculate the reason is due to the enhanced field-effect passivation at the pinhole surrounding. In fact, the variation of the passivation quality depends on the balance between a strengthened field-effect passivation and an excessive local Auger recombination, being both effects induced by the higher and deeper level of dopants diffused into the c-Si surface through the pinholes.@en

The integration of photovoltaic (PV) technology in urban environments poses new challenges for the design of PV modules. In particular, the poor shading tolerance of conventional PV modules strongly limits the energy performance of urban PV systems. In this work, we analyze how interdigitated back-contact solar cells with low-breakdown voltages can help improve the shading tolerance of PV modules. Through detailed simulations, we show that the breakdown voltage can be tuned without significantly degrading the efficiency of the solar cell. Simulation results indicate that, under partial shading conditions, cells with a 0.3-V breakdown voltage could boost by 20% the annual yield of conventional crystalline silicon PV modules with three bypass diodes. These findings are supported by a four-month-long monitoring campaign of PV modules with different breakdown characteristics, which shows a specific yield gain of about 4% in PV modules with six bypass diodes.

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Bifacial (BF) copper-plated crystalline silicon solar cell is an attractive topic to concurrently reduce silver consumption and maintain good device performance. However, it is still challenging to realize a high aspect ratio (AR) of the metal fingers. Herein, a new type of hybrid-shaped Cu finger is electromagnetically fabricated in a BF plating process. Cyclic voltammetry is employed to disclose the electrochemical behaviors of cupric ions in monofacial and simultaneous BF Cu-plating processes, such that the controllability of the plating process could be assessed. The optimal hybrid Cu finger is composed of a rectangular bottom part and a round top part, such that an utmost effective AR value of 1.73 is reached. In BF Cu-plating, two sub-three-electrode electrochemical cells are employed to realize equal metal finger heights on both sides of the wafer. Compared to our low thermal-budget screen-printing metallization, the Cu-plated silicon heterojunction devices show both optical and electrical advantages (based on lab-scale tests). The champion BF Cu-plated device shows a front-side efficiency of 22.1% and a bifaciality factor of 0.99.

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Excellent surface passivation induced by (i)a-Si:H is critical to achieve high-efficiency silicon heterojunction (SHJ) solar cells. This is key for conventional single-junction cell applications but also for bottom cell application in tandem devices. In this study, we investigated the effects of (i)a-Si:H deposition temperature on passivation quality and SHJ solar cell performance. At the lower end of temperatures ranging from 140°C to 200°C, it was observed with Fourier-transform infrared spectroscopy (FTIR) that (i)a-Si:H films are less dense, thus hindering their surface passivation capabilities. However, with additional hydrogen plasma treatments (HPTs), those (i)a-Si:H layers deposited at lower temperatures exhibited significant improvements and better passivation qualities than their counterparts deposited at higher temperatures. On the other hand, even though we observed the highest V_OCs for cells with (i)a-Si:H deposited at the lowest temperature (140°C), the related FFs are poorer as compared to their higher temperature counterparts. The optimum trade-off between V_OC and FF for the SHJ cells was found with temperatures ranging from 160°C to 180°C, which delivered independently certified efficiencies of 23.71%. With a further improved p-layer that enables a FF of 83.3%, an efficiency of 24.18% was achieved. Thus, our study reveals two critical requirements for optimizing the (i)a-Si:H layers in high-efficiency SHJ solar cells: (i) excellent surface passivation quality to reduce losses induced by interface recombination and simultaneously (ii) less-defective (i)a-Si:H bulk to not disrupt the charge carrier collections.

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In this chapter, we have reviewed candidates for further enhancement of cell efficiencies beyond those of today's mainstream PERC cells, with a focus on technological aspects rather than, e.g. cost. Regarding silicon single junctions, the prevalent theme is the use of carrier-selective passivating contacts, CSPCs. Of these, silicon heterojunction and polysilicon-on-silicon oxide (TOPCon/POLO) are most advanced and have enabled record high efficiencies above and close to 26%, respectively, on n-type silicon wafers. Further important topics are bifacial cell designs, which can be applied to different PV technologies. Single-side efficiencies above 25% have been achieved on bifacial TOPCon and bifacial SHJ solar cells. With proven bankability, bifacial PV products can be expected to gain more momentum in future development. In contrast, contacts based on metal compounds have yielded remarkable results in the last decade, yet failing to clearly evidence a significant advantage compared to the ones based on silicon. Further research is needed to unravel the material combination that would enable the long-awaited ultimate passivating contact for Si solar cells.

The second major topic are tandem and multijunction cells. This is the technology to move beyond the ultimate efficiency barrier of 29.4% for silicon PV and indeed, efficiencies well above 29% have been demonstrated in the lab for Si-based tandems. We have reviewed the current state of the art in lead halide perovskite-silicon tandems as well as III-V/silicon tandems. The former have reached a record PCE of 32.5% in monolithically integrated 2-terminal tandems, while III-V/Si 2T tandems currently stand at 23.4%. However, in III-V-Si devices, the number of absorbers has already been increased further, to three: in triple junction III-V/III-V/Si cells, PCEs of 35.9% have been realized with both 2T and 4T architectures. With a substantially higher cost for the III-V technology as compared to perovskites, but still inferior long-term stability in perovskites, as well as challenges in upscaling for both technologies, it remains to be seen which one of these technologies will gain an advantage. It should be mentioned that an important difference between reported silicon single junction and tandem/multijunction record devices is the cell area: while the single junction Si record devices have "industrial-size" active areas of several tens of cm2 or even full wafers, record tandem cells are lab-scale 1-4 cm2. Thus, up-scaling of tandem cells will remain an important topic in the near future.

At any rate, it can be expected that the exponential growth of PV as well as the diversity of applications (utility, rooftop and BIPV, agri-PV, etc.) will create ample opportunity for the market entry of quite a few of the mentioned technologies, and even for entirely new concepts such as three-terminal tandems or, at the module level, integrated PV and storage systems.@en

We compared the morphology and Raman response of nanoscale shaped surfaces of Si substrates versus monocrystalline Si. Samples were structured by reactive ion etching, and four of them were covered by a RuO₂-IrO₂ layer. Raman bands, centred at approx. 520 cm^–1, belonging to samples processed by etching the Si surface have intensities higher by approximately one order of magnitude than those of reference non-etched samples. For nanostructured samples, the rise in the Raman signal was 12–14 ×, which is in agreement with the model of the electric field at the tips of Si due to their geometry. This phenomenon is related to the high absorption of excitation radiation. Nanostructured surfaces of samples containing a layer of RuO₂-IrO₂ give rise to the phenomenon of surface enhancement of the Raman response most likely due to the charge transfer at the interface between silicon and conductive oxides. The nanostructured surface of Si without a metal layer behaves as a SERS substrate and detects the analytes at a low concentration.

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Two terminal multi-junction (MJ) photovoltaic (PV) devices are well established concepts to increase the solar-to-electrical power conversion in reference to single PV junctions. In multi-junction PV devices two consecutive sub-cells are interconnected using a tunnel recombination junction (TRJ) in which the light excited holes of one sub-cell recombine with the light excited electrons of the other sub cell. An ideal TRJ is an ohmic contact with non-rectifying behaviour. TRJ's based on p- and n-doped silicon-oxides have been successfully applied in a variety of hybrid multi-junction PV devices in which tunnelling and trap-assisted tunnelling over width of 5–20 nm rules the TRJ's recombination kinetics. In this contribution the qualitative fundamental working principles of tunnel recombination junctions based on p- and n-doped silicon and silicon-oxide alloys are revealed using both electrical modelling and experiments based on a unique set of tandem lab cells (four types based on four different PV materials) combined with structural variations in TRJ architectures. The study results in design rules for the integration of silicon-oxide based TRJ's and provides fundamental insights into the sensitivity of the electrical performance of the TRJ's to doping concentrations, to alignment of the conduction and valence bands of consecutive sub-cells, to the nature of interface defects, to the growth of amorphous and crystalline phases and its dependence on substrate or seed layers and to the nanoscale thicknesses of the TRJ layers.

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Crystalline silicon solar cells with passivating contacts based on doped poly-Si exhibit high optical parasitic losses. Aiming at minimizing these losses, we developed the oxygen-alloyed poly-Si (poly-SiOx) as suitable material for passivating contacts. From passivation point of view, poly-SiOx layers show excellent passivation quality and carrier selectivity for both n-type (iVOC,flat = 740 mV, contact resistance ρc = 0.7 mΩ/cm2, iVOC,textured = 723 mV) and p-type (iVOC,flat = 709 mV, ρc = 0.5 mΩ/cm2). Optically, due to the incorporation of oxygen, the absorption coefficient of poly-SiOx becomes much lower than that of doped poly-Si at long wavelength. Both n-type and p-type poly-SiOx layers are concurrently deployed in front/back-contacted (FBC) solar cells with a front indium tin oxide (ITO) layer to facilitate the lateral transport of carriers and minimize cell's reflection. A high cell FF of 83.5% obtained in double-side flat FBC solar cell indicates an efficient carrier collection by these passivating contacts. An active-area cell efficiency of 21.0% featuring JSC,EQE = 39.7 mA/cm2 is obtained in front-side textured poly-SiOx FBC cell, with the potential of further improvement in both VOC and FF. The optical advantage of poly-SiOx over poly-Si as passivating contact is also observed with a 19.7% interdigitated back-contacted (IBC) solar cell endowed with poly-SiOx emitter and back surface field. Compared to the reference 23.0% IBC solar cell with poly-Si passivating contacts, the one based on poly-SiOx passivating contacts shows higher IQE at wavelengths above 1100 nm. This indicates that for both FBC and IBC cells, poly-SiOx passivating contacts hold potential in enhancing the cell JSC by maximizing the cell spectral response.@en

Organic-inorganic metal halide perovskites have attracted a considerable interest in the photovoltaic scientific community demonstrating a rapid and unprecedented increase in conversion efficiency in the last decade. Besides the stunning progress in performance, the understanding of the physical mechanisms and limitations that govern perovskite solar cells are far to be completely unravelled. In this work, we study the origin of their hysteretic behaviour from the standpoint of fundamental semiconductor physics by means of technology computer aided design electrical simulations. Our findings identify that the density of shallow interface defects at the interfaces between perovskite and transport layers plays a key role in hysteresis phenomena. Then, by comparing the defect distributions in both spatial and energetic domains for different bias conditions and using fundamental semiconductor equations, we can identify the driving force of hysteresis in terms of slow recombination processes and charge distributions.@en

Reducing indium consumption, which is related to the transparent conductive oxide (TCO) use, is a key challenge for scaling up silicon heterojunction (SHJ) solar cell technology to terawatt level. In this work, we developed bifacial SHJ solar cells with reduced TCO thickness. We present three types of In₂O₃-based TCOs, tin-, fluorine-, and tungsten-doped In₂O₃ (ITO, IFO, and IWO), whose thickness has been optimally minimized. These are promising TCOs, respectively, from post-transition metal doping, anionic doping, and transition metal doping and exhibit different opto-electrical properties. We performed optical simulations and electrical investigations with varied TCO thicknesses. The results indicate that (i) reducing TCO thickness could yield larger current in both monofacial and bifacial SHJ devices; (ii) our IWO and IFO are favorable for n-contact and p-contact, respectively; and (iii) our ITO could serve well for both n-contact and p-contact. Interestingly, for the p-contact, with the ITO thickness reducing from 75 nm to 25 nm, the average contact resistivity values show a decreasing trend from 390 mΩ cm² to 114 mΩ cm². With applying 25-nm-thick front IWO in n-contact, and 25-nm-thick rear ITO use in p-contact, we obtained front side efficiencies above 22% in bifacial SHJ solar cells. This represents a 67% TCO reduction with respect to a reference bifacial solar cell with 75-nm-thick TCO on both sides.

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Thin films of transition metal oxides such as molybdenum oxide (MoO_x) are attractive for application in silicon heterojunction solar cells for their potential to yield large short-circuit current density. However, full control of electrical properties of thin MoO_x layers must be mastered to obtain an efficient hole collector. Here, we show that the key to control the MoO_x layer quality is the interface between the MoO_x and the hydrogenated intrinsic amorphous silicon passivation layer underneath. By means of ab initio modelling, we demonstrate a dipole at such interface and study its minimization in terms of work function variation to enable high performance hole transport. We apply this knowledge to experimentally tailor the oxygen content in MoO_x by plasma treatments (PTs). PTs act as a barrier to oxygen diffusion/reaction and result in optimal electrical properties of the MoO_x hole collector. With this approach, we can thin down the MoO_x thickness to 1.7 nm and demonstrate short-circuit current density well above 40 mA/cm² and a champion device exhibiting 23.83% conversion efficiency.

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