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AE Grigorescu

9 records found

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

Sub-10 nm resolution electron beam lithography in ultrathin HSQ resist layers
Doctoral thesis (2009) - AE Grigorescu (author)

Resist thickness effects on ultra thin HSQ patterning capabilities

Towards 2-10 nm electron-beam lithography: a quantitative approach

High-dose exposure of silicon in electron beam lithography

Limiting Factors for electron beam lithography when using ultra-thin HSQ layers

10 nm lines and spaces written in HSQ using electron beam lithography

Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

Sub- 10-nm structures written in ultra-thin HSQ resist layers, using Electron Beam Lithography