High-dose exposure of silicon in electron beam lithography

Journal article (2008)

Authors

AE Grigorescu ImPhys/Charged Particle Optics

M.C. van der Krogt QN/Kavli Nanolab Delft -

E.W.J.M. van der Drift QN/Kavli Nanolab Delft -

C.W. Hagen ImPhys/Charged Particle Optics

C. W. Hagen ImPhys/Charged Particle Optics

Research Group

ImPhys/Charged Particle Optics

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Published Date

2008

Language

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Research Group

ImPhys/Charged Particle Optics