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AE Grigorescu

9 records found

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

Resist thickness effects on ultra thin HSQ patterning capabilities

Sub-10 nm resolution electron beam lithography in ultrathin HSQ resist layers
Doctoral thesis (2009) - AE Grigorescu (author)

High-dose exposure of silicon in electron beam lithography

Towards 2-10 nm electron-beam lithography: a quantitative approach

Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

Sub- 10-nm structures written in ultra-thin HSQ resist layers, using Electron Beam Lithography

Limiting Factors for electron beam lithography when using ultra-thin HSQ layers

10 nm lines and spaces written in HSQ using electron beam lithography