AN

A.M. Nugrowati

14 records found

Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Near field intermediate fields of an ultrashort pulse transmitted through Young's double-slit experiment.

Vectorial Diffrection of Extreme Ultraviolet Light and Ultrashort Light Pulses.
Doctoral thesis (2008) - A.M. Nugrowati (author)

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati (author)

Erratum: Interference or not: Analysis of the young's experiment for a single-cycle pulse

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati (author)

Polarisation-sensitive ultrashort pulse shaping by narrow metal slits

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati (author)

Combining various optical simulations tools to enable complex optical systems simulations.

Numerical analysis of aslit-groove diffrection problem

EUV phase mask engineering based on image optimisation.

Rigorous calculation of the time evolution of an ultrashort pulse through slit structures in the near and intermediate zones.

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.