AN

A.M. Nugrowati

14 records found

Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Erratum: Interference or not: Analysis of the young's experiment for a single-cycle pulse

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati (author)

Combining various optical simulations tools to enable complex optical systems simulations.

Near field intermediate fields of an ultrashort pulse transmitted through Young's double-slit experiment.

Vectorial Diffrection of Extreme Ultraviolet Light and Ultrashort Light Pulses.
Doctoral thesis (2008) - A.M. Nugrowati (author)

Polarisation-sensitive ultrashort pulse shaping by narrow metal slits

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati (author)

Studying light Diffraction at A Small Scale: applications and theories.
Poster (2008) - A.M. Nugrowati (author)

Numerical analysis of aslit-groove diffrection problem

Rigorous calculation of the time evolution of an ultrashort pulse through slit structures in the near and intermediate zones.

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

EUV phase mask engineering based on image optimisation.

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.