Ref. [56] was unfortunately wrong, Instead of [56] Corless, R. M.; Gonnet, G. H.; Hare, D. E. G.; Jeffrey, D. J.; Knuth, D. E. On the Lambert W function. Adv. Comput. Math. 1996, 5, 329–359. It should be changed to Biswas, R. K.; Khan, P.; Mukherjee, S.; Mukhopadhyay, A. K.; Ghosh, J.; Muraleedharan, K. Study of short range structure of amorphous Silica from PDF using Ag radiation in laboratory XRD system, RAMAN and NEXAFS. J. Non. Cryst. Solids 2018, 488, 1–9. Some entries in Table 2 were unfortunately misprinted.

Thin layers of MoO_x have been deposited by thermal evaporation followed by post-deposition annealing. The density of states distributions of the MoO_x films were extracted deconvoluting the absorption spectra, measured by a photothermal deflection spectroscopy setup, including the small polaron contribution. Results revealed a sub-band defect distribution centered 1.1 eV below the conduction band; the amplitude of this distribution was found to increase with post-deposition annealing temperature and film thickness.

The application of molybdenum oxide in the photovoltaic field is gaining traction as this material can be deployed in doping-free heterojunction solar cells in the role of hole selective contact. For modeling-based optimization of such contact, knowledge of the molybdenum oxide defect density of states (DOS) is crucial. In this paper, we report a method to extract the defect density through nondestructive optical measures, including the contribution given by small polaron optical transitions. The presence of defects related to oxygen-vacancy and of polaron is supported by the results of our opto-electrical characterizations along with the evaluation of previous observations. As part of the study, molybdenum oxide samples have been evaluated after post-deposition thermal treatments. Quantitative results are in agreement with the result of density functional theory showing the presence of a defect band fixed at 1.1 eV below the conduction band edge of the oxide. Moreover, the distribution of defects is affected by post-deposition treatment. [Figure not available: see fulltext.]