Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Journal article (2022)

Authors

A. Santoso ChemE/Product and Process Engineering - AS
Afke Damen Student
J.R. van Ommen ChemE/Product and Process Engineering - AS
Volkert Van Steijn ChemE/Product and Process Engineering - AS
V. Van Steijn ChemE/Product and Process Engineering - AS
Volkert van Steijn ChemE/Product and Process Engineering - AS
V. van Steijn ChemE/Product and Process Engineering - AS
Research Group
ChemE/Product and Process Engineering (AS) (TU Delft)
Copyright: © 2022 A. Santoso, Afke Damen, J.R. van Ommen, V. van Steijn
DOI: https://doi.org/10.1039/d2cc02402k
More Info
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Published Date

2022

Language

English

Faculty

Applied Sciences

Department

ChemE/Chemical Engineering

Research Group

ChemE/Product and Process Engineering

Abstract

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.