X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

Journal article (2002)

Authors

L Jiang External organisation
AG Fitzgerald External organisation
MJ Rose External organisation
R Cheung External organisation
B Rong External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2002

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft