Approach to the characterization of through-oxide boron implantation by secondary ion mass spectrometry.

Journal article (2000)

Authors

ZX Jiang External organisation
S Backer External organisation
JJ Lee External organisation
LY Wu External organisation
T Guenther External organisation
D Sieloff External organisation
P Choi External organisation
M Foisy External organisation
P.F.A. Alkemade Old - sect Electronic Materials (NS/EM)
Research Group
Old - sect Electronic Materials (NS/EM)
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Published Date

2000

Language

Undefined/Unknown

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Research Group

Old - sect Electronic Materials (NS/EM)