High resolution reactive ion etching of GaN and etch-induced effects.

Journal article (1999)

Authors

R Cheung External organisation
RJ Reeves External organisation
B Rong QN/Kavli Nanolab Delft - AS
SA Brown External organisation
EJM Fakkeldij External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
M. Kamp External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

1999

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft