Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

Journal article (2009)

Authors

VA Sidorkin QN/Kavli Nanolab Delft - AS
P.F.A. Alkemade QN/Fysics of NanoElectronics , QN/Kavli Nanolab Delft - AS
H.W.M. Salemink QN/Photronic Devices
R. Schmits External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2009

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft