Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization.

Journal article (2001)

Authors

N Iossad QN/Fysics of NanoElectronics

BD Jackson QN/Fysics of NanoElectronics

SN Polyakov External organisation

PN Dmitriev External organisation

T.M. Klapwijk QN/Fysics of NanoElectronics

Research Group

QN/Fysics of NanoElectronics

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Published Date

2001

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Research Group

QN/Fysics of NanoElectronics