Experimental validation of a piezoelectrically driven photomask curvature manipulator

Conference paper (2012)

Authors

C.L. Valentin Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering
JPM Vermeulen External organisation
BCT van Bree External organisation
R.H. Munnig Schmidt Mechatronic Systems Design - Mechanical, Maritime and Materials Engineering
Research Group
Mechatronic Systems Design (Mechanical, Maritime and Materials Engineering) (TU Delft)
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Published Date

2012

Language

English

Reuse Rights

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Faculty

Mechanical, Maritime and Materials Engineering

Department

Precision and Microsystems Engineering

Research Group

Mechatronic Systems Design

Abstract

Photolithography is the critical step in realizing a smaller feature size of Integrated Circuits (IC). Manufacturing beyond the 30 [nm] node requires tighter focus budgets in ArF immersion lithography systems [1]. Wafer non-flatness and lens heating are main focus-budget contributors [2, 3]. Their contribution can be reduced by exposing the wafer with a curved instead of the conventional flat focal plane (Figure 1). This effect is achieved by manipulating the photomask curvature during the exposure process. A piezoelectric actuation system has been developed for this purpose which can control the photomask curvature [4]. This paper revisits the actuation principle and presents the experimental validation of the concept in a functional model.