Molybdenum nanopillar arrays

Fabrication and engineering

Journal article (2021)

Authors

L.A. Maduro QN/Conesa-Boj Lab - AS , Kavli institute of nanoscience Delft
Charles de Boer Kavli institute of nanoscience Delft
M.R. Zuiddam Kavli institute of nanoscience Delft, QN/Kavli Nanolab Delft - AS
E. Memisevic BUS/Quantum Delft - QuTech Advanced Research Centre , Kavli institute of nanoscience Delft
S. Conesa Boj Kavli institute of nanoscience Delft, QN/Conesa-Boj Lab - AS
Research Group
QN/Conesa-Boj Lab (AS) (TU Delft)
Copyright: © 2021 L.A. Maduro, Charles de Boer, M.R. Zuiddam, E. Memisevic, S. Conesa Boj
DOI: https://doi.org/10.1016/j.physe.2021.114903
More Info
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Published Date

2021

Language

English

Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Conesa-Boj Lab

Abstract

We report on the fabrication of molybdenum (Mo) nanopillar (NP) arrays with NP diameters down to 75 nm by means of deep-reactive ion etching at cryogenic temperatures. A variable-thickness Mo metal layer sputtered onto a Si3N4/Si substrate makes possible NPs with different lengths in a controllable manner. We demonstrate how our fabrication strategy leads to tunable cross-sections with different geometries, including hexagonal, cylindrical, square and triangular shapes, by using electron beam lithography on hydrogen silsesquioxane negative tone resist. To ensure well-defined facets and surfaces, we employ deep-reactive ion etching in a gas mixture of SF6 and O2 at cryogenic temperatures in an inductively coupled plasma reactive ion etching (ICP-RIE) system. These results represent an attractive route towards the realization of high-density Mo NP arrays for applications from nanoelectronics to quantum sensing and hydrogen evolution reaction catalysis.