High quality SiO2 deposited at 80oC by inductively coupled plasma enhanced CVD for flexible display application

Journal article (2010)

Authors

T Chen Electronic Components, Technology and Materials - EEMCS
R. Ishihara Electronic Components, Technology and Materials - EEMCS
C.I.M. Beenakker Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2010

Language

English

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials