Thermal-mechanical coupling simulation of Chiplet 2.5D packaging based on chiplet distribution and Full Copper Interconnection

Conference Paper (2026)
Author(s)

Shizhen Li (Southern University of Science and Technology )

Chenshan Gao (Southern University of Science and Technology )

Xu Liu (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Huaiyu Ye (The Joint Laboratory for Advanced Packaging and Test Technology for Integrated Circuits, TU Delft - Electrical Engineering, Mathematics and Computer Science, Southern University of Science and Technology , The Joint Laboratory for Advanced Semiconductor Packaging Technologies, The Joint Laboratory for Advanced Situation Awareness)

Guoqi Zhang (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1109/EuroSimE69483.2026.11511898 Final published version
More Info
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Publication Year
2026
Language
English
Research Group
Electronic Components, Technology and Materials
Publisher
IEEE
ISBN (electronic)
9798331562496
Event
27th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2026 (2026-04-19 - 2026-04-22), Warsaw, Poland
Page Views
92
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Abstract

The semiconductor industry is facing significant challenges, including physical limitations such as heat dissipation, rising manufacturing costs, and the difficulty of further shrinking transistor sizes while maintaining performance. To address these issues, chiplet technology has emerged, integrating smaller, specialized chips into a single package. This approach improves modularity, manufacturing yields, and allows mixing different technology nodes for optimal performance. However, challenges like ensuring high-speed, low-latency interconnects and effective thermal management persist.This study explores several key aspects of chiplet technology using a simplified dual-chip model, focusing on the integration of nanocopper materials. By comparing nanocopper with traditional solder, we analyze differences in mechanical behavior and thermal management. Additionally, we investigate variations in chiplet layout, examining the impact of spacing and the number of chiplets on performance under identical power conditions. Our findings indicate that nanocopper interconnects provide lower stress and better thermal conductivity than traditional solder. Adjusting chiplet spacing and increasing the number of chiplets both enhance heat dissipation. Future work will involve larger-scale simulations and fatigue analyses to optimize chiplet packaging for improved performance and reliability.

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