Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based divices

Journal article (1997)

Authors

JWH Maes Old organisation TN/TechnischeNatuurkunde voorm
PW Lukey External organisation
T Zijlstra QN/Kavli Nanolab Delft - AS
CCG Visser External organisation
J. Caro-Schuurman QN/Fysics of NanoElectronics
J. Caro QN/Fysics of NanoElectronics
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
F.D. Tichelaar OLD Virtual Materials and Mechanics
S Radelaar OLD Metals Processing, Microstructures and Properties
Department
Old organisation TN/TechnischeNatuurkunde voorm
More Info
expand_more

Published Date

1997

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Department

Old organisation TN/TechnischeNatuurkunde voorm