The Near Field Characteristics of teh Focused Field Embedded in the Super-RENS Layer Applied to Lithography

Journal article (2012)

Authors

A. da Costa Assafrao ImPhys/Optics - AS
S.F. Pereira ImPhys/Optics - AS
Paul Urbach ImPhys/Optics - AS
H. P. Urbach ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
More Info
expand_more

Published Date

2012

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics